Merged gate and source/drain contacts in a semiconductor device

ABSTRACT

Provided are approaches for forming merged gate and source/drain (S/D) contacts in a semiconductor device. Specifically, one approach provides a dielectric layer over a set of gate structures formed over a substrate; a set of source/drain (S/D) openings patterned in the dielectric layer between the gate structures; a fill material formed over the gate structures, including within the S/D openings; and a set of gate openings patterned over the gate structures, wherein a portion of the dielectric layer directly adjacent the fill material formed within one of the S/D openings is removed. The fill material is then removed, selective to the dielectric layer, and a metal material is deposited over the semiconductor device to form a set of gate contacts within the gate openings, and a set of S/D contacts within the S/D openings, wherein one of the gate contacts and one of the S/D contacts are merged.

BACKGROUND

Technical Field

This invention relates generally to the field of semiconductors, andmore particularly, to approaches used in forming contacts insemiconductor devices.

Related Art

A typical integrated circuit (IC) chip includes a stack of severallevels or sequentially formed layers of shapes. Each layer is stacked oroverlaid on a prior layer and patterned to form the shapes that definedevices (e.g., fin-type field effect transistors (FinFETs)) and connectthe devices into circuits. In a typical state of the art complementaryinsulated gate FinFET process, such as what is normally referred to asCMOS, layers are formed on a wafer to form the devices on a surface ofthe wafer. Further, the surface may be the surface of a silicon layer ona silicon on insulator (SOI) wafer. A simple FinFET is formed by theintersection of two shapes, i.e., a gate layer rectangle on a siliconisland formed from the silicon surface layer. Each of these layers ofshapes, also known as mask levels or layers, may be created or printedoptically through well-known photolithographic masking, developing andlevel definition, e.g., etching, implanting, deposition, etc.

For FinFET devices, it is typical to have a source/drain contact strapover an active region (Rx) to make sure all FINs are connected bycontact. Prior art approaches consist of etching a contact hole in thecontact strap layer (TS), or contact layer, and then filling the holewith a metal to contact source and drain. The shape of the contact plugis dictated by the shape of the hole, which is usually tapered, yetclose to vertical. However, with the current tapered shape of contactsto source and drain, it becomes difficult to expect yield for a contactthat allows contact resistance in specification, while avoiding bridgingat the top of adjacent contacts.

Another issue with current art approaches is performing a uniform,repeatable contact to the S/D areas. With FinFET technology, a contactarea typically encompasses a number of fins. Because of processvariability and design rules constraints related to crowding at the topof the contacts, design becomes problematic at 14 nm and smaller becausethe fin located on the edge of the contact receives only partialcoverage with the contact metal, thus resulting in an increasedresistance.

In another prior art approach, middle of line (MOL) processing for 14 nmFinFET fully encapsulates the gate in nitride. A contact to S/D isetched through oxide, selectively to nitride (TS level). This contact istherefore self-aligned. After TS metallization and CMP, an Inter-LayerDielectric (ILD) film is deposited, and the S/D contact to TS and gatecontact are processed.

In yet another prior art approach, a replacement metal contact scheme isused for contact to S/D at 10XM dimensions because the requirements interms of overlay for the S/D triple patterning are too stringent toexpect yield otherwise. However, this prevents the processing ofcontact(s) to gate before the S/D contacts, as is the case with 14XM.Furthermore, this integration degrades the critical dimensions (CD) whenstripping the dummy organic planarizing layer (OPL) filling the S/Dcontact cavity.

SUMMARY

In general, provided are approaches for forming merged gate andsource/drain (S/D) contacts in a semiconductor device (e.g., a FinFET).Specifically, one approach provides a dielectric layer (e.g., siliconoxycarbide) over a set of gate structures formed over a substrate; a setof source/drain (S/D) openings patterned in the dielectric layer betweenthe gate structures; a fill material (e.g., a deep ultraviolet lightabsorbing oxide) formed over the gate structures, including within theS/D openings; and a set of gate openings patterned over the gatestructures, wherein a portion of the dielectric layer directly adjacentthe fill material within one of the S/D openings is removed. The fillmaterial is then removed, selective to the dielectric layer, and a metalmaterial is deposited over the semiconductor device to form a set ofgate contacts within the gate openings and a set of S/D contacts withinthe S/D openings, wherein one of the gate contacts and one of the S/Dcontacts are merged.

One aspect of the present invention includes a method of forming asemiconductor device, the method comprising: providing a dielectriclayer over a set of gate structures formed over a substrate; patterninga set of source/drain (S/D) openings in the dielectric layer between theset of gate structures; forming a fill material over the set of gatestructures, including within the set of S/D openings; patterning a setof gate openings over the set of gate structures, wherein a portion ofthe dielectric layer directly adjacent the fill material within one ofthe set of S/D openings is removed; and removing the fill materialselective to the dielectric layer.

Another aspect of the present invention includes a method for formingmerged gate and source/drain (S/D) contacts in a semiconductor device,the method comprising: providing a dielectric layer over a set of gatestructures formed over a substrate; patterning a set of source/drain(S/D) openings in the dielectric layer between the set of gatestructures; forming a deep ultraviolet light absorbing oxide (DUO) fillover the set of gate structures, including within the set of S/Dopenings; patterning a set of gate openings over the set of gatestructures, wherein a portion of the dielectric layer directly adjacentthe DUO fill within one of the set of S/D openings is removed; andremoving the DUO fill selective to the dielectric layer.

Another aspect of the present invention includes a semiconductor deviceincluding merged gate and source/drain (S/D) contacts, the semiconductordevice comprising: a set of gate structures formed over a substrate; aset of source/drain (S/D) openings patterned in a dielectric layerbetween the set of gate structures; and a set of gate openings patternedover the set of gate structures, wherein at least one of the set of gateopenings and at least one of the set of S/D openings are merged.

BRIEF DESCRIPTION OF THE DRAWINGS

These and other features of this invention will be more readilyunderstood from the following detailed description of the variousaspects of the invention taken in conjunction with the accompanyingdrawings in which:

FIG. 1 shows a side cross-sectional view of a set of contactplaceholders and a set of gate structures following a first S/D etchaccording to illustrative embodiments;

FIG. 2 shows a side cross-sectional view of the semiconductor devicefollowing formation of a dielectric layer over the set of gatestructures according to illustrative embodiments;

FIG. 3 shows a side cross-sectional view of the semiconductor devicefollowing removal of a portion of the set of contact placeholdersaccording to illustrative embodiments;

FIG. 4 shows a side cross-sectional view of the semiconductor devicefollowing removal of the remaining portion of the set of contactplaceholders according to illustrative embodiments;

FIG. 5 shows a side cross-sectional view of the semiconductor devicefollowing deposition of a fill material according to illustrativeembodiments;

FIG. 6 shows a side cross-sectional view of the semiconductor devicefollowing formation of a patterned lithography mask according toillustrative embodiments;

FIG. 7 shows a side cross-sectional view of the semiconductor devicefollowing formation of a set of gate openings according to illustrativeembodiments;

FIG. 8 shows a side cross-sectional view of the semiconductor devicefollowing removal of the fill material selective to the dielectricmaterial;

FIG. 9 shows a side cross-sectional view of the semiconductor devicefollowing removal of a capping layer from atop the set of gatestructures within the set of gate openings and from atop a set of finswithin the set of S/D openings according to illustrative embodiments;and

FIG. 10 shows a side cross-sectional view of the semiconductor devicefollowing deposition of metal material to form a set of gate contactswithin the set of gate openings and a set of S/D contacts within the setof S/D openings according to illustrative embodiments.

The drawings are not necessarily to scale. The drawings are merelyrepresentations, not intended to portray specific parameters of theinvention. The drawings are intended to depict only typical embodimentsof the invention, and therefore should not be considered as limiting inscope. In the drawings, like numbering represents like elements.

Furthermore, certain elements in some of the figures may be omitted, orillustrated not-to-scale, for illustrative clarity. The cross-sectionalviews may be in the form of “slices”, or “near-sighted” cross-sectionalviews, omitting certain background lines, which would otherwise bevisible in a “true” cross-sectional view, for illustrative clarity.Furthermore, for clarity, some reference numbers may be omitted incertain drawings.

DETAILED DESCRIPTION

Exemplary embodiments will now be described more fully herein withreference to the accompanying drawings, in which one or more approachesare shown. It will be appreciated that this disclosure may be embodiedin many different forms and should not be construed as limited to theexemplary embodiments set forth herein. Rather, these exemplaryembodiments are provided so that this disclosure will be thorough andcomplete and will fully convey the scope of this disclosure to thoseskilled in the art. The terminology used herein is for the purpose ofdescribing particular embodiments only and is not intended to belimiting of this disclosure. For example, as used herein, the singularforms “a”, “an”, and “the” are intended to include the plural forms aswell, unless the context clearly indicates otherwise. Furthermore, theuse of the terms “a”, “an”, etc., do not denote a limitation ofquantity, but rather denote the presence of at least one of thereferenced items. It will be further understood that the terms“comprises” and/or “comprising”, or “includes” and/or “including”, whenused in this specification, specify the presence of stated features,regions, integers, steps, operations, elements, and/or components, butdo not preclude the presence or addition of one or more other features,regions, integers, steps, operations, elements, components, and/orgroups thereof.

Reference throughout this specification to “one embodiment,” “anembodiment,” “embodiments,” “exemplary embodiments,” or similar languagemeans that a particular feature, structure, or characteristic describedin connection with the embodiment is included in at least one embodimentof the present invention. Thus, appearances of the phrases “in oneembodiment,” “in an embodiment,” “in embodiments” and similar languagethroughout this specification may, but do not necessarily, all refer tothe same embodiment.

The terms “overlying” or “atop”, “positioned on” or “positioned atop”,“underlying”, “beneath” or “below” mean that a first element, such as afirst structure, e.g., a first layer, is present on a second element,such as a second structure, e.g. a second layer, wherein interveningelements, such as an interface structure, e.g. interface layer, may bepresent between the first element and the second element.

As used herein, “depositing” may include any now known or laterdeveloped techniques appropriate for the material to be depositedincluding but not limited to, for example: chemical vapor deposition(CVD), low-pressure CVD (LPCVD), plasma-enhanced CVD (PECVD),semi-atmosphere CVD (SACVD) and high density plasma CVD (HDPCVD), rapidthermal CVD (RTCVD), ultra-high vacuum CVD (UHVCVD), limited reactionprocessing CVD (LRPCVD), metal-organic CVD (MOCVD), sputteringdeposition, ion beam deposition, electron beam deposition, laserassisted deposition, thermal oxidation, thermal nitridation, spin-onmethods, physical vapor deposition (PVD), atomic layer deposition (ALD),chemical oxidation, molecular beam epitaxy (MBE), plating, evaporation,etc.

As stated above, embodiments herein provide approaches for formingmerged gate and source/drain (S/D) contacts in a semiconductor device(e.g., a FinFET). Specifically, one approach provides a dielectric layer(e.g., silicon oxycarbide (SiOC)) over a set of gate structures formedover a substrate; a set of source/drain (S/D) openings patterned in thedielectric layer between the gate structures; a fill material (e.g., adeep ultraviolet light absorbing oxide) formed over the gate structures,including within the S/D openings; and a set of gate openings patternedover the gate structures, wherein a portion of the dielectric layerdirectly adjacent the fill material within one of the S/D openings isremoved. The fill material is then removed, selective to the dielectriclayer, and a metal material is deposited over the semiconductor deviceto form a set of gate contacts within the gate openings, and a set ofS/D contacts within the S/D openings, wherein one of the gate contactsand one of the S/D contacts are merged. As such, these approaches enablethe use of DUO instead of OPL, which is beneficial because DUO possessesthe benefit to behave like an oxide at dry etch, thus allowing forstitching (i.e., electrically connecting) the gate contact to the S/Dcontact. Furthermore, these approaches do not suffer from degraded CD,e.g., when stripping the DUO material within the S/D openings due to theuse of the SiOC interlayer dielectric.

With reference now to the figures, FIG. 1 shows a semiconductor device100 (e.g., a FinFET device) having a substrate 102 and a set of gatestructures 104A-N (e.g., replacement metal gates (RMG)) formed oversubstrate 102. Device 100 further comprises a set of fins 108 patternedfrom substrate 102.

The term “substrate” used herein is intended to include a semiconductorsubstrate, a semiconductor epitaxial layer deposited or otherwise formedon a semiconductor substrate and/or any other type of semiconductorbody, and all such structures are contemplated as falling within thescope of the present invention. For example, the semiconductor substratemay comprise a semiconductor wafer (e.g., silicon, SiGe, or an SOIwafer) or one or more die on a wafer, and any epitaxial layers or othertype semiconductor layers formed thereover or associated therewith. Aportion or the entire semiconductor substrate may be amorphous,polycrystalline, or single-crystalline. In addition to theaforementioned types of semiconductor substrates, the semiconductorsubstrate employed in the present invention may also comprise a hybridoriented (HOT) semiconductor substrate in which the HOT substrate hassurface regions of different crystallographic orientation. Thesemiconductor substrate may be doped, undoped, or contain doped regionsand undoped regions therein. The semiconductor substrate may containregions with strain and regions without strain therein, or containregions of tensile strain and compressive strain.

Gate structures 104A-N are shown following a self-aligned contact (SAC)SiN CMP and RMG formation process in which each gate structure 104A-N isopened and then filled with a recessed gate dielectric and metal stack(e.g., HfO2 as gate dielectric, TiN and W as gate metal), inside thecavity bordered by sidewall spacers (e.g., SiN or SiOCN low k), followedby a capping layer 110 (e.g., SiN or SiOCN low k). Capping layer 110 isformed by recessing with etch the metal gate then depositing SiNfollowed by chemical mechanical planarization (CMP). As understood tothose skilled in the art, the CMP process involves contacting a materiallayer to be polished with a rotating polishing pad. An abrasive slurrycomprising an abrasive suspended in an aqueous solution, which may alsocontain chemical constituents to achieve selectivity, is disposedbetween the polishing pad and the material layer to be polished. Thematerial layer to be polished is then polished away with the polish padand slurry to achieve a desired removal.

Fins 108 may be fabricated using any suitable process including one ormore photolithography and etch processes. The photolithography processmay include forming a photoresist layer (not shown) overlying substrate102 (e.g., on a silicon layer), exposing the resist to a pattern,performing post-exposure bake processes, and developing the resist toform a masking element including the resist. The masking element maythen be used to etch fins 108 into the silicon layer, e.g., usingreactive ion etch (RIE) and/or other suitable processes. In oneembodiment, fins 108 are formed using a sidewall image transfertechnique. In yet another embodiment, fins 108 are formed by adouble-patterning lithography (DPL) process. DPL is a method ofconstructing a pattern on a substrate by dividing the pattern into twointerleaved patterns. DPL allows enhanced feature (e.g., fin) density.Various DPL methodologies may be used including, but not limited to,double exposure (e.g., using two mask sets), forming spacers adjacentfeatures and removing the features to provide a pattern of spacers,resist freezing, and/or other suitable processes.

The resulting structure includes set of fins 108 having sidewalls beingsubstantially orthogonal to a top surface of substrate 102. In analternative embodiment, fins 108 may be epitaxially grown from a topsurface of substrate 102 within trenches or openings formed in apatterned layer atop substrate 102. Fins 108 serve as the fin structurefor device 100. The FinFET device may comprise a single fin or multiplefins. As shown in FIG. 1, a nitride capping layer 112 is formed atopeach of fins 108 after the gate RMG process so as to act as a ContactEtch Stop Layer (CESL) during further processing of the source/draincontact etch.

As further shown, device 100 comprises a set of contact placeholders 116following a first S/D etch. In this embodiment, each of contactplaceholders 116 includes an oxide layer, for instance a tetra ethylortho silicate (TEOS) 118 beneath a nitride layer 120. In variousembodiments, contact placeholders 116 are formed (e.g., patterned from aset of layers) using one or more lithography and etch processes.

Although not specifically shown for the sake of brevity, semiconductor100 further includes a set of S/D features formed on opposite sides of achannel region. The S/D features may be formed by recessing a portion ofsubstrate 102 to form source/drain recessing trenches and epitaxiallygrowing a semiconductor material layer in the sources/drains recessingtrenches. The semiconductor material layer includes elementsemiconductor material such as germanium (Ge), silicon (Si), or compoundsemiconductor materials, such as gallium arsenide (GaAs), aluminumgallium arsenide (AlGaAs); or semiconductor alloy, such as silicongermanium (SiGe), or gallium arsenide phosphide (GaAsP). The epitaxialprocesses include CVD deposition techniques (e.g., vapor-phase epitaxy(VPE) and/or ultra-high vacuum CVD (UHVCVD)), molecular beam epitaxy,and/or other suitable processes. The S/D features may be formed by oneor more epitaxy or epitaxial (epi) processes. The S/D features may bein-situ doped during the epi process. For example, the epitaxially grownSiGe S/D features may be doped with boron; and the epitaxially grown Siepi S/D features may be doped with carbon to form Si:C source/drainfeatures, phosphorous to form Si:P source/drain features, or both carbonand phosphorous to form SiCP source/drain features. In one embodiment,the S/D features are not in-situ doped. Instead, an implantation process(i.e., a junction implant process) is performed to dope the S/Dfeatures. One or more annealing processes may be performed to activatethe source/drain epitaxial feature. The annealing processes compriserapid thermal annealing (RTA) and/or laser annealing processes.

FIG. 2 shows semiconductor device 200 following deposition and etch back(or CMP) of a dielectric layer 224 (e.g., a flowable chemical vapordeposited (FCVD) insulator such as silicon oxycarbide (SiOC)) over setof gate structures 204A-N according to illustrative embodiments. Asshown, dielectric layer 224 is removed selective to nitride 220 ofcontact placeholders 216.

FIG. 3 shows semiconductor device 300 following removal of nitride 220(FIG. 2) according to illustrative embodiments. In an exemplaryembodiment, the nitride atop TEOS 318 is removed using a deglaze and hotphosphoric (hot phos) acid process so as to selectively etch the nitridewith respect to the SiOC dielectric layer 324. TEOS 318 is then removed(e.g., via a wet oxide removal process selective to SiOC and SiN, forinstance in a diluted hydrofluoric acid (dHF) solution) to form a set ofS/D openings 428A-B, as shown in FIG. 4. The carbon content ofdielectric layer 324 makes it impervious to the dHF wet etch (unlikestandard SiO2, which is not).

FIG. 5 shows semiconductor device 500 following deposition of aself-planarizing fill material 530. In an exemplary embodiment, fillmaterial 530 comprises a deep ultraviolet light absorbing oxide (DUO)formed over gate structures 504A-N, including within gate openings428A-B (FIG. 4).

Next, a patterned lithography layer 636 is formed over device 600, asshown in FIG. 6. Lithography layer 636 has a set of openings used topattern a set of gate openings 738A-B over set of gate structures704A-N, as shown in FIG. 7. In this embodiment, gate openings 738A-B areformed using a RIE, resulting in a partial etch to capping layers 710atop one or more of gate structures 704A-N (e.g., gate structure 704-B).As shown, gate opening 738-B exposes fill material 730 formed within oneof the S/D openings by removing a portion 640 (FIG. 6) of dielectriclayer 724 directly adjacent fill material 730. In an exemplaryembodiment, each gate opening 738A-B has sloped sidewalls thatconverge/narrow towards set of gate structures 704A-N.

Fill material 730 is then removed, as demonstrated by device 800 of FIG.8. In this embodiment, the fill material (e.g., DUO) is removedselective to SiOC dielectric layer 824 using an O2 plasma (ash process).In an exemplary embodiment, the fill material comprises DUO, which isbeneficial because DUO possesses the characteristics to behave like anoxide at etch, thus allowing for stitching (i.e., electricallyconnecting) gate and S/D contacts following metallization. DUO behaveslike SIO2 (or SiOC) during dry etch (e.g., RIE), yet can be selectivelyremoved by ash. Furthermore, device 800 does not suffer from degradedCD, e.g., when stripping the DUO material within the S/D openings828A-B.

Next, the capping layer is removed from atop set of gate structures804A-N (i.e., SiN capping layer 810) within set of gate openings 838A-B,and from atop set of fins 808 (i.e., CESL 812) within S/D openings828A-B to uncover the Si and SiGe of the source/drain, resulting indevice 900 shown in FIG. 9.

FIG. 10 shows semiconductor device 1000 following deposition andplanarization of a metal material. The metal material may be formed of athin liner of Ti/TiN (e.g., with thickness in the range of 1 to 4 nm)and a metal fill consisting of CVD W or Co, for instance. As shown,semiconductor device 1000 includes a set of S/D contacts 1042A-B and aset of gate contacts 1044A-B, wherein at least one of S/D contacts1042A-B is merged with at least one of gate contacts 1044A-B. In thisembodiment, S/D contact 1042-A and gate contact 1044-B are stitched(i.e., directly electrically connected).

In various embodiments, design tools can be provided and configured tocreate the datasets used to pattern the semiconductor layers asdescribed herein. For example data sets can be created to generatephotomasks used during lithography operations to pattern the layers forstructures as described herein. Such design tools can include acollection of one or more modules and can also be comprised of hardware,software or a combination thereof. Thus, for example, a tool can be acollection of one or more software modules, hardware modules,software/hardware modules or any combination or permutation thereof. Asanother example, a tool can be a computing device or other appliance onwhich software runs or in which hardware is implemented. As used herein,a module might be implemented utilizing any form of hardware, software,or a combination thereof. For example, one or more processors,controllers, ASICs, PLAs, logical components, software routines, orother mechanisms might be implemented to make up a module. Inimplementation, the various modules described herein might beimplemented as discrete modules or the functions and features describedcan be shared in part or in total among one or more modules. In otherwords, as would be apparent to one of ordinary skill in the art afterreading this description, the various features and functionalitydescribed herein may be implemented in any given application and can beimplemented in one or more separate or shared modules in variouscombinations and permutations. Even though various features or elementsof functionality may be individually described or claimed as separatemodules, one of ordinary skill in the art will understand that thesefeatures and functionality can be shared among one or more commonsoftware and hardware elements, and such description shall not requireor imply that separate hardware or software components are used toimplement such features or functionality.

It is apparent that there has been provided approaches for formingmerged gate and S/D contacts. While the invention has been particularlyshown and described in conjunction with exemplary embodiments, it willbe appreciated that variations and modifications will occur to thoseskilled in the art. For example, although the illustrative embodimentsare described herein as a series of acts or events, it will beappreciated that the present invention is not limited by the illustratedordering of such acts or events unless specifically stated. Some actsmay occur in different orders and/or concurrently with other acts orevents apart from those illustrated and/or described herein, inaccordance with the invention. In addition, not all illustrated stepsmay be required to implement a methodology in accordance with thepresent invention. Furthermore, the methods according to the presentinvention may be implemented in association with the formation and/orprocessing of structures illustrated and described herein as well as inassociation with other structures not illustrated. Therefore, it is tobe understood that the appended claims are intended to cover all suchmodifications and changes that fall within the true spirit of theinvention.

What is claimed is:
 1. A method of forming a semiconductor device, themethod comprising: forming a set of contact placeholders over both a setof fins and a capping layer over the set of fins, the set of contactplaceholders comprising nitride atop an oxide; providing a dielectriclayer over a set of gate structures formed over a substrate and over theset of contact placeholders; patterning a set of source/drain (S/D)openings in the dielectric layer between the set of gate structures;removing the nitride from atop the oxide; removing the oxide selectiveto the dielectric layer and the capping layer; and forming a fillmaterial over the set of gate structures, including within the set ofS/D openings; patterning a set of gate openings over the set of gatestructures, wherein a portion of the dielectric layer directly adjacentthe fill material formed within one of the set of S/D openings isremoved, and at least one gate opening of the set of gate openingsexposes on a bottom of the gate opening only a part or all of one gatestructure of the set of gate structures; removing the fill materialselective to the dielectric layer; and removing the capping layer fromatop the set of gate structures within the set of gate openings and fromatop the set of fins within the set of S/D openings.
 2. The methodaccording to claim 1, further comprising depositing a metal materialover the semiconductor device to form a set of gate contacts within theset of gate openings and a set of S/D contacts within the set of S/Dopenings, wherein at least one of the set of gate contacts and at leastone of the set of S/D contacts are merged.
 3. The method according toclaim 1, the patterning the set of gate openings comprising partiallyetching the capping layer atop the set of gate structures within the setof gate openings.
 4. The method according to claim 1, the dielectriclayer comprising silicon oxycarbide (SiOC), and the fill materialcomprising a deep ultraviolet light absorbing oxide (DUO).
 5. The methodaccording to claim 4, the DUO removed selective to the SiOC using an O2plasma process (Ash).
 6. The method according to claim 1, wherein eachof the set of gate openings has sloped sidewalk that converge towardsthe set of gate structures.
 7. A method for forming merged gate andsource/drain (S/D) contacts in a semiconductor device, the methodcomprising: forming a set of contact placeholders over both a set offins and a capping layer over the set of fins, the set of contactplaceholders comprising nitride atop an oxide; providing a dielectriclayer over a set of gate structures formed over a substrate and over theset of contact placeholders; patterning a set of source/drain (S/D)openings in the dielectric layer between the set of gate structures;removing the nitride from atop the oxide; removing the oxide selectiveto the dielectric layer and the capping layer; forming a deepultraviolet light absorbing oxide (DUO) fill over the set of gatestructures, including within the set of S/D openings; patterning a setof gate openings over the set of gate structures, wherein a portion ofthe dielectric layer directly adjacent the DUO fill formed within one ofthe set of S/D openings is removed, and at least one gate opening of theset of gate openings exposes on a bottom of the gate opening only a partor all of one gate structure of the set of gate structures; removing theDUO fill selective to the dielectric layer; and removing the cappinglayer from atop the set of gate structures within the set of gateopenings and from atop a set of fins within the set of STD openings. 8.The method according to claim 7, further comprising depositing a metalmaterial over the semiconductor device to form a set of gate contactswithin the set of gate openings and a set of S/D contacts within the setof S/D openings, wherein at least one of the set of gate contacts and atleast one of the set of S/D contacts are merged.
 9. The method accordingto claim 7, the patterning the set of gate openings comprising partiallyetching the capping layer atop the set of gate structures within the setof gate openings.
 10. The method according to claim 7, the dielectriclayer comprising silicon oxycarbide (SiOC), wherein the DUO is removedselective to the SiOC using an O2 plasma process.
 11. The methodaccording to claim 7, wherein each of the set of gate openings hassloped sidewalls that converge towards the set of gate structures.